High concentration of nitrogen doped into graphene using N-2 plasma with an aluminum oxide buffer layer
Park, SH (Park, Sang Han), Chae, J (Chae, Jimin), mann-ho cho, Kim, JH (Kim, Joo Hyoung), Kyung-hwa Yoo, Sang Wan Cho, Kim, TG (Kim, Tae Gun), Kim, JW (Kim, Jeong Won)
JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.5, pp.933-939