The diffusion of silicon atoms in stack structures of La2O3 and Al2O3
Lee, WJ (Lee, W. J.), Ma, JW (Ma, J. W.), Bae, JM (Bae, J. M.), Kim, CY (Kim, C. Y.), Jeong, KS (Jeong, K. S.), mann-ho cho, Chung, KB (Chung, K. B.), Kim, H (Kim, H.), Cho, HJ (Cho, H. J.), Kim, DC (Kim, D. C.)
Current Applied Physics, v.13, no.4, pp.633-639