Changes in the structure of an atomic-layer-deposited HfO2 film on a GaAs (100) substrate as a function of postannealing temperature
Kim, CY, Cho, SW, mann-ho cho, Chung, KB, Suh, DC, DAE HONG KO,, An, CH, Kim, H, Lee, HJ
Applied Physics Letters, v.95, pp.042903-1-042903-3