PUBLICATION

Journal paper

  • Electronic and structural characteristics of Zr-incorporated Gd2O3 films on strained SiGe substrates

    Baeck, JH, Park, SA, Lee, WJ, Jeong, IS, KwangHo JEONG, mann-ho cho, Kim, YK, Min, BG, DAE HONG KO

    Journal of Chemical Physics, v.130, no.20, pp.204510-204510

    2009.05

  • Nucleation Behavior of Atomic Layer Deposited SiO2 for Hf-Silicate Films

    Chung, KB, Lee, WJ, Kim, CY, mann-ho cho, Moon, DW

    Journal of the Electrochemical Society, v.156, pp.G43-G47

    2009.03

  • Study of Hafnium Silicate Treated with NO Gas Annealing

    Suh, DC, DAE HONG KO,, mann-ho cho, Chung, KB

    Journal Of The Korean Physical Society, v.54, pp.637-642

    2009.02

  • Structural Stability and Phase-Change Characteristics of Ge2Sb2Te5/SiO2 Nano-Multilayered Films

    Jang, MH, Park, SJ, Lim, DH, mann-ho cho, Kim, YK, Yi, HJ, Kim, HS

    Electrochemical And Solid State Letters, v.12, pp.H151-H154

    2009.02

  • Instability of incorporated nitrogen in HfO2 films grown on strained Si0.7Ge0.3 layers

    Chung, KB, Lucovsky, G, Lee, WJ, mann-ho cho, Jeon, H

    Applied Physics Letters, v.94

    2009.01

  • Thermal stability of Ni-Pt-Ta alloy silicides on epi-Si1-xCx

    Yoo, JH, Chang, HJ, Min, BG, DAE HONG KO,, mann-ho cho, HYUNCHUL SOHN, Lee, TW

    Materials Science And Engineering B-Advanced Functional Solid-State Materials, v.154, pp.183-186

    2008.12

  • Interfacial reaction of atomic-layer-deposited HfO2 film as a function of the surface state of an n-GaAs (100) substrate

    Kim, C.Y. , Cho, S.W. , cho mann-ho, Chung, K.B. , An, C.-H. , Kim, H. , Lee, H.J. , KO, DAE HONG

    Applied Physics Letters, v.93, no.19, pp.192902-0

    2008.11

  • Band gap change and interfacial reaction in Hf-silicate film grown on Ge(001)

    Cho YJ (Cho, Y. -J.), Lee WJ (Lee, W. J.), Kim CY (Kim, C. Y.), cho mann-ho, Kim H (Kim, H.), Lee HJ (Lee, H. J.), Moon DW (Moon, D. W.), Kang HJ (Kang, H. J.)

    Journal of Chemical Physics, v.129, no.16

    2008.10

  • Energy level alignment in N,N `-bis(1-naphthyl)-N,N `-diphenyl-1,1 `-biphenyl-4,4 `-diamine (NPB)/hexadecafluoro copper phthalocyanine (F16CuPc)/Au and NPB/CuPc/Au heterojunction

    Cho, Sang Wan, Yi, Yeonjin, Noh, Myungkeun, Cho, Mann-Ho, Yoo, KyLlng-Hwa, Jeong, Kwangho, Whang, Chung-Nam

    Synthetic Metals, v.158, no.13, pp.539-543

    2008.08

  • Improvement of the contact resistance between ITO and pentacene using various metal-oxide interlayers

    Kim, H. , Sohn, S. , Jung, D. , Maeng, W.J. , Kim, H. , Kim, T.S. , Hahn, J. , Lee, S. , Yi, Y. , cho mann-ho

    Organic Electronics, v.9, no.6, pp.1140-1145

    2008.08