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Journal paper

  • Evaluation of the electrical properties and interfacial reactions for the polycrystalline Si1-xGex(x=0,0.6)/HfO2 gate stack

    Kang SK, Nam S, Min BG, Nam SW, DAE HONG KO,, mann-ho cho

    APPLIED PHYSICS LETTERS, v.83, no.10, pp.2004-2006

    2003.09

  • Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation

    mann-ho cho, Shin, JS, Roh, YS, Lyo, In-Whan, KwangHo JEONG, Chung Nam WHANG,, Lee, JS, Yoo, JY, Lee, NI, Fujihara, K, Moon, DW

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.21, pp.1004-1008

    2003.07

  • Effect of deposition conditions of poly Si1-xGex films and Ge atoms on the electrical properties of poly Si1-xGex (x=0,0.6)/HfO2 gate stack

    Kang, SK, Nam, S, Min, BG, Nam, SW, DAE HONG KO,, mann-ho cho

    JOURNAL OF APPLIED PHYSICS, v.94, pp.4608-4613

    2003.01

  • Interfacial Reaction in Poly Si1-xGex/ZrO2 with Ge Content in Poly Si1-xGex films

    KO,DAE HONG, chomann-ho

    Electro Cemical and Solid State Letter, v.0, no.0, pp.113-115

    2002.12

  • Chemical structure of ultrathin SiO2 film with nitrogen incorporated by remote nitrogen plasma

    WHANG,Chung Nam, JEONGKwangHo, chomann-ho

    Journal of Vaccum Science & Technology A, v.20, no.5, pp.1676-1681

    2002.09

  • Thermal Stability and Structural Characteristics of HfO2 films on Si(100) Grown by Atomic-layer Deposition

    WHANG,Chung Nam, JEONGKwangHo, KO,DAE HONG, chomann-ho

    APPLIED PHYSICS LETTERS, v.8, no.3, pp.472-474

    2002.07

  • Dielectric characteristics of Al2O3-HfO2 nanolaminates on Si(100)

    mann-ho cho, Y.S. Roh, Chung Nam WHANG,, KwangHo JEONG, H.J. Choi, S.W.Nam, DAE HONG KO,, J.H.Lee, L.I.Lee, K.Fujihara

    APPLIED PHYSICS LETTERS, v.81, pp.1071-1073

    2002.01

  • YSi2-x formation in the presence of interfacial SiO2 layer

    mann-ho cho, DAE HONG KO,, Y.G. Choi, Lyo, In-Whan, KwangHo JEONG, Chung Nam WHANG

    JOURNAL OF APPLIED PHYSICS, v.92, pp.5555-5559

    2002.01

  • Epitaxial Y2O3 film growth on an oxidized Si surface

    mann-ho cho, DAE HONG KO,, Y.K. Choi, Lyo, In-Whan, KwangHo JEONG, Chung Nam WHANG

    THIN SOLID FILMS, v.402, no.1-2, pp.38-42

    2002.01

  • Annealing effects of aluminum silicate films grown on Si(100)

    mann-ho cho, Y.S. Rho, DAE HONG KO,, I.W.Lyo, Chung Nam WHANG,, K. Jeong

    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.20, pp.865-872

    2002.01