Electrical properties of the HfO2-Al2O3 nanolaminates with homogeneous and graded compositions on InP
Chandreswar Mahata, An, Y., Choi, S., Byun, Y.-C., Kim, D.-K., taeyoon Lee, Kim, J., mann-ho cho, Kim, H.
CURRENT APPLIED PHYSICS, v.16, no.3, pp.294-299